GaAs Monolayer Growth Control by Molecular Beam Epitaxy.
نویسندگان
چکیده
منابع مشابه
Impurity Breakdown in GaAs Samples Grown by Molecular Beam Epitaxy
In this work we present studies for the behavior of impurity breakdown of two GaAs samples grown by Molecular Beam Epitaxy at 200oC and 300oC. We vary the temperature and the illumination intensity. For the sample grown at 200oC, the transport mechanism after the breakdown is of the same type of the main free carriers at low electric elds. Below 100K, a clear dependence of the threshold electri...
متن کاملAlGaAs/GaAs Heterostructure Solar Cells Grown by Molecular Beam Epitaxy
The AlGaAs/GaAs heterostructure solar cells were fabricated by molecular beam epitaxy (MBE), which provides ultra-thin molecular layers of the design structure. The typical efficiency of the solar cells fabricated and their characteristics are η = 17%, Voc = 0.73 V, Isc = 33 mA/cm, and F.F. = 0.7. Spectral response of the solar cells show a broad spectrum ranging from 500 to 900 nm, correspondi...
متن کاملGrowth of InP on GaAs „001... by hydrogen-assisted low-temperature solid-source molecular beam epitaxy
Direct heteroepitaxial growth of InP layers on GaAs 001 wafers has been performed by solid-source molecular beam epitaxy assisted by monoatomic hydrogen H . The epitaxial growth has been carried out using a two-step method: for the initial stage of growth the temperature was as low as 200 °C and different doses of H were used; after this, the growth proceeded without H while the temperature was...
متن کاملPseudomorphic growth and strain relaxation of α-Zn3P2 on GaAs(001) by molecular beam epitaxy
Tetragonal zinc phosphide (a-Zn3P2) was grown pseudomorphically, by compound-source molecularbeam epitaxy on GaAs(001). The films grew coherently strained, with epitaxial relationships of Zn3P2(004):GaAs(002) and Zn3P2(202):GaAs(111). Partial relaxation of the Zn3P2 lattice was observed for films that were 4150 nm in thickness. Van der Pauw and Hall effect measurements indicated that carrier mo...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Nihon Kessho Gakkaishi
سال: 1991
ISSN: 0369-4585,1884-5576
DOI: 10.5940/jcrsj.33.129